Used SVG 88 Series #9192887 for sale
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ID: 9192887
Single track coater
Configuration:
Empty space for 2nd track
Send- Coa t-HPO-Receive
System cabinet:
Footprint:
Coat system: 42" Deep X 60" Wide X 38" High (with out CP)
Coat system: 42" Deep X 72" Wide X 38" High (with CP)
System frame:
Internal frame: Standard powder coated black
External panels: Stainless steel
Wafer type: Silicon
Wafer size: 3" Wafer round with flats
Wafer flow: Left to right
Rear of system bulkhead fittings and facility connections for:
Process chemicals: Photoresist, EBR solvents
Process gasses: Clean dry air, nitrogen
Process exhaust
Teflon insulated mainframe wiring
Process chemical dispense lines:
PFA or FEP - Photoresist
SVG Style card cage keypad and display with SVG software control:
Z80 Microprocessor control
(9) Events per program
Times variable from 0. to 99.0 sec. in 0.1 sec
Machine diagnostics: Machine and sensor status
System capable of processing wafers:
Automatic
Single or manual modes
Independent microprocessor control for each track
Automated transfer arm system for module to module wafer transfer
Emergency stop access front of system
Power junction box: 208V, 60Hz, 25A.
SVG 88 Series is a photoresist equipment used to protect predetermined areas of a substrate from exposure to a reactive material. It consists of a light source, photosensitive coating, and mask plate. The light source is typically a laser or flash lamp, while the photosensitive coating is a light-sensitive polymer. When exposed to a source of light, the photosensitive polymer reacts and becomes opaque, forming an opaque layer of photoresist. This layer acts as a mask, shielding the areas of the substrate from the reactive material. Typically, the mask plate is placed between the substrate and the light source. A pattern of the areas that need to be protected is etched onto the mask plate, allowing the light to pass through to the underlying photosensitive coating layer only where the mask plate has the pattern. This causes the photosensitive coating to be exposed to the light only where the mask plate has the pattern, resulting in the parts of the photosensitive coating associated with those areas becoming opaque and forming a photoresist layer. 88 Series system is designed to provide a consistent, detailed, and precisely patterned photoresist layer. This layer of photoresist is used to selectively protect the substrate from damage when exposed to the reactive material, such as an etchant or other type of reactive solution. This allows the technician to use this unit to protect specified areas of the substrate, providing detailed control and accuracy for the fabrication process. SVG 88 Series machine can be used with various types of substrates, such as metal, glass, plastic, or ceramics. It has also proven to be useful in the fabrication of integrated circuits, nanotechnology devices, and other cutting-edge materials and processes. Depending on the type of material being used, the light source has the ability to adjust the power level, energy level, and duration of the exposure, allowing detailed control and precision within the photoresist layer. 88 Series is an accurate and precise tool for creating photoresist layers, making it an invaluable tool in the fabrication of various materials and components. By providing a consistent and precisely patterned photoresist layer, it is able to protect predetermined areas of the substrate from being exposed to a destructive reactive material, thereby providing greater accuracy and control in the fabrication process.
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