Used SVG 88 #9128815 for sale

SVG 88
Manufacturer
SVG
Model
88
ID: 9128815
Wafer Size: 6"
Coater system, 6".
SVG 88 is a photoresist equipment that uses a mix of light and chemical composition to create a photolithographic canvas. It combines a positive photosensitive composition with a light source to create photosensitive patterns that are then transferred onto an appropriate substrate. 88 photo resist system is an easy-to-use unit that provides a high-resolution photolithographic canvas. The machine is composed of two separate components - the positive photoresist and the light source. The photoresist is responsible for generating an electrical current when exposed to light, while the light source is what enables the light to act on the photoresist. SVG 88 consists of four main layers - the first layer is a substrate layer consists of a flat surface composed of materials such as aluminum, glass, and polymer. On top of the substrate is a thin polymer layer that acts as an etching mask. The second layer is a thin film of photoresist which is exposed to ultraviolet light from the light source. The UV light causes polymer chains in the photoresist to form a network of molecular structures that generate an electrical current when exposed to light. The third layer is a layer of water which is placed on top of the photoresist, usually in the form of a spray. This layer acts as a resist or barrier against the light and helps to direct the light only where it is wanted on the photoresist. The final layer is a second substrate made of either glass or metal and meant to absorb the electrical current generated by the exposure of the light. Using this tool, the user can control the pattern generated on the photoresist by changing the light source intensity, exposure time, and composition of the photoresist material. In addition, UV lamps, developed specifically for 88, can help to further enhance the desired results by providing a more focused, controllable light source. SVG 88 is a versatile and powerful tool that can be used in a wide variety of photolithographic applications including the development of printed circuit boards and patterns for optical test devices. The high precision resolution and ease of use make it an ideal tool for the development of intricate designs and patterns.
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