Used SVG 8800 #9307770 for sale

SVG 8800 is a photoresist system used in the fabrication of integrated circuits. It is designed to provide high resolution and accuracy whenpatterning semiconductor devices and other electrical, mechanical and optoelectronic components. 8800 has the capability to process both wet develop and dry etch processes and is capable of processing substrates up to 8 inches in diameter. The system is equipped with an imaging laser source, imaging optics, scanner, beam profiler, laser motion controller and a variety of photoresist coating and processing chambers. The imaging laser source provides the necessary light source for patterning the photoresist on the substrate. The light emitted from the source is adjusted to the required wavelength and intensity level for efficiently exposing the photoresist to the laser light. The imaging optics focus the light emitting from the laser source onto the photoresist surface. This ensures that an accurate pattern of the photoresist layer is produced. The scanner then uses the focused light to pattern the photoresist on the substrate. The beam profiler is used to measure the beam profile of the laser beam. This allows for fine adjustment of the light intensity and enabling the user to achieve optimal patterning of the photoresist layer. The laser motion controller is employed to ensure that the light patterns generated have minimum distortions and at the same time maintain the correct dose distribution. By adjusting the laser position along the x, y and z axes, alignment and focus of the laser beam can be adjusted to obtain optimal illumination of the photoresist layer. The photoresist coating and processing chambers enable the user to coat and develop the photoresist accordingly. These chambers are equipped with spinners, pressure vessels, dispense heads, and temperature control systems. All these systems work in unison to ensure that the photoresist is coated and developed with an optimal definition and layer thicknesses. SVG 8800 is an advanced photoresist system that is highly reliable and efficient. It takes into account all the different aspects in the photoresist fabrication, enabling designers to pattern devices with excellent accuracy and reliability.