Used SVG 8820 #293749266 for sale

SVG 8820 is a photoresist system that enables reliable lithography processes in the production of integrated circuit (IC) devices. It is a positive-tone deep-UV resist that is optimized for double-patterning approaches such as self-aligned double patterning (SADP) and pitch split double patterning (PSC). It has proven to be an essential tool for lowering the cost of creating small feature sizes for ICs. At the core of 8820 system are the photoresist materials. These are liquid photoresists that are designed to be applied to a semiconductor wafer in a thin, uniform film. Upon exposure to light sources such as UV lasers, the photoresist undergoes a chemical reaction that causes it to become insoluble in a developer solution. This selective insolubility allows for the development of lithographic structures. SVG 8820 is optimized for use with 193 nm immersion lithography tools. It is compatible with both single and double patterning approaches. Its deep-UV absorbency allows for higher resolution than traditional photoresists and ensures the exposure of deep-uv wavelengths in both single and double patterning processes. Additionally, the absorbency of 8820 ensures better line edge roughness, and reduced topographical and line-end effects. Furthermore, SVG 8820 exhibits higher sensitivity than conventional photoresists, allowing for higher throughputs of exposed wafers per day. Its solubility in a developer solution allows for swift post-exposure processing. It also works well with printable inks for wafer-level shrink, making this system particularly advantageous for scaling up the lithography process for a larger range of wafer sizes. 8820 is designed for use in advanced lithography processes for the most demanding processes in chip manufacturing. Its high resolution and sensitivity makes it an ideal choice for double-patterned IC devices, and its solubility in a developer allows for a swift process which makes it an attractive choice for large-scale wafer production.