Used SVG 8826 #293825860 for sale

Manufacturer
SVG
Model
8826
ID: 293825860
Wafer Size: 6"
Coater, 6" Dual track Coat Bake.
SVG 8826 is a commercial, high-resolution developed photoresist equipment by Brewer Science, Inc. It is designed to provide optimal results in a range of digital lithography applications, including flip chip and advanced semiconductor device fabrication. 8826 photoresist system is based on a unique patented technology utilizing a combination of a resin matriculated with electron-beam (e-beam) irradiated forms to produce high-resolution photoresist images with superior image quality and surface finishes. This technology allows for improved image resolution, uniformity, line edge and width control, and improved linearity. This photoresist unit is composed of a range of proprietary components. Specifically, an optimized photosensitive layer is designed to provide improved performance in both 193 nm and 248 nm lithography. The optimized photosensitive layer is composed of a special organic charge regulating polymer blend tailored to improve overall image resolution, uniformity, and edge sharpness. Furthermore, this layer is also designed to provide superior radiation response and minimal sensitivity to airborne contaminants. The images produced by SVG 8826 are highly uniform in both positive-tone and negative-tone imaging modes across a variety of substrates. This ensures improved yield during semiconductor integration process steps such as trimming, lamination, and baking. Additionally, the photoresist machine is designed to provide excellent CD linearity over a wide exposure range, allowing for improved control throughout the lithography process. Lastly, 8826 photoresist tool offers excellent shelf life and productivity, with minimal swelling or retardation effects. This ensures low-cost of ownership and improved performance in a variety of downstream processes. In conclusion, SVG 8826 photoresist asset by Brewer Science, Inc. is designed to provide optimal performance in digital lithography applications, offering superior imaging resolution, uniformity, and excellent CD linearity. Its proprietary components and enhanced radiation response make it an ideal choice for semiconductor device fabrication.
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