Used SVG 8826 #9375679 for sale

SVG 8826 is a photoresist equipment developed by Shipley Company, LLC. It is a multi-layer resist system designed for use in semiconductor and integrated circuit manufacturing processes. It is designed to have superior performance in a wide variety of processes, including wafer etching, lithography, and dielectric deposition, as well as wafer thinning, back grinding, and dicing. 8826 is comprised of a positive chemically-amplified (CA) multi-layer photoresist consisting of three layers: the bottom layer is a base layer, which provides adhesion and temperature stability for the unit; the middle layer is a QC/PMIR layer; and the top layer is the PSIR layer, which provides protection for the underlying layers from reactive ion etching (RIE) and other high-energy etch processes. The machine has been designed to provide improved performance on critical photolithography applications such as patterning critical layers or providing features of 1-2µm on General or Advanced I/O schemes. It has an excellent detection margin, high resolution profile, and etch resistance. The tool also has excellent reflectivity control, light exposure control, and overlay registration performance. Additionally, the asset is designed to provide improved process margins for resolution, adhesion, etching, and exposure latitude. It has a safe resist strip process on SiO2 by using chlorine (Cl2 ) or fluorine (F2 ) based CHF3 plasmas, providing improved process control over the traditional wet strip techniques. The model also provides challenging cleanroom conditions with minimal particulate and metal contamination. Finally, SVG resist equipment supports a wide range of process conditions including front side (phaseshift), back side (epsilonlithography), i-line and KrF exposure, positive and negative tone, halftone multi-beam exposure, and thick film/low k applications. It also has a broad range of coating configurations including single layer, double layer, and triple layer.