Used SVG 8826 #9375680 for sale

SVG 8826
Manufacturer
SVG
Model
8826
ID: 9375680
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SVG 8826 is a photosensitive resist system used in microelectronic fabrication processes. The resist is deposited onto the wafer surface using a spin-on technique, which is then exposed to radiation in order to create a pattern. The resist then undergoes a chemical treatment to create a crosslinked structure that functions as a reliable masking material for various etching and implantation processes. The resist system is composed of three layers - a film layer, a buffer layer and a polymerizable layer - which together form a highly reliable photosensitive resist. The film layer is a chemically-amplified resist that absorbs photons from incident radiation and polymerizes to form a stable layer. The buffer layer is made of a thermostable polymer that aids in the etching process; it increases the etch rate while maintaining substrate compatibility. The polymerizable layer is sensitive to radiation and undergoes a polymerization reaction upon exposure. This layer further enhances resistance to etching while maintaining fidelity in the patterns created by the exposed pattern. The resist can be exposed to deep UV light at a wavelength of 248nm, thereby increasing its photosensitivity. In addition, 8826 exhibits excellent thermal stability at temperatures up to 450°C. This ensures that the structural integrity of the resist layer remains intact while undergoing complex fabrication processes. Moreover, the resist can be used with various substrate materials such as Si, SiGeC, and Sapphire. The solvent-based resist architecture is also compatible with a variety of deposition processes, including chemical vapor deposition (CVD) and low-pressure chemical vapor deposition (LPCVD). SVG 8826 system provides a highly stable and reliable photosensitive resist. It can be used in a wide range of fabrication processes, and is capable of withstanding temperatures up to 450°C. It is compatible with a variety of deposition processes and substrate materials, further enhancing its versatility in microelectronic applications.
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