Used SVG 8826 #9399874 for sale

SVG 8826 is an advanced photoresist equipment developed by Shin-Etsu Chemical Co. Ltd. (SEC). It is a specialty negative-working photoresist system designed to provide superior performance in highly demanding plasma etch and resist stripping applications. The unit is composed of two components: a polyimide-based film and a developer solution. The polyimide-based film used in 8826 is constructed of an aromatic polyimide substrate with a crosslinked polyvinyl alcohol-based photoresist layer. This creates a highly stable, yet resilient structure which is able to withstand harsh thermal and plasma processing conditions. The polyvinyl alcohol-based photoresist layer is specially formulated to resist organic solvents and etchants, making it well-suited for etch and resist stripping applications. It also exhibits good resolution of fine lines and high lithographic control. The accompanying developer solution is developed to provide excellent contrast in both positive and negative development processes. It is based on a proprietary, proprietary azo-substituted amide and exhibits low surface tension, long shelf-life and high resolution. Additionally, it features high rinse efficiency in both aqueous and non-aqueous baths, making it suitable for reuse or reuse of chemicals. In addition to its exceptional performance characteristics, SVG 8826 machine is also cost effective. The polyimide-based film can be easily processed without the need for additional chemicals, as it features high resistance to organic solvents and chemicals, as well as low side reaction during thermal and plasma etch. Additionally, the reusable developer solution provides cost savings when compared to single-use developing solutions. Taken together, 8826 is a specially engineered photoresist tool which provides excellent performance characteristics for a low cost. Furthermore, its unique compositions and processing capabilities make it suited for advanced plasma etch and resist stripping applications. Ultimately, SVG 8826 offers an effective and reliable photoresist asset tailor-made for demanding applications.