Used SVG 8832 / 8836 #9033927 for sale

SVG 8832 / 8836 is a photoresist equipment designed specifically for the plasma etching process in semiconductor manufacturing. It is a low-molecular weight, polyvinyl-acetate based photoresist system which is designed to resist etching of surfaces in both wet and dry etching environments. It has a high tolerance for ion bombardment, allowing it to be used in processes such as reactive-ion etching and mechanical milling. 8832 / 8836 unit consists of three different layers. The first layer is a photoresist layer, which is a film of photosensitive material that is exposed to a light source. It contains molecules that are sensitive to the light and react to the exposure by forming exposed and unexposed regions within the film. The unexposed regions are resistant to chemical etching while the exposed regions are more susceptible to etching. The second layer is a capping polymer which binds the photoresist layer to the surface of the wafer. It also serves to prevent photoresist from etching away due to ion bombardment and reactive etching. The third layer is a post-exposure bake layer, which is a thin protective film of silicon oxide. This layer is formed as a result of exposure to the light source and serves to protect the photoresist during processing. SVG 8832 / 8836 machine has been used successfully in the fabrication of advanced semiconductor devices such as microprocessors and DRAMs. It provides a high degree of protection to the layers underneath it from thermal, chemical and radiation damage. Furthermore, it is a low-cost photoresist tool and is therefore suitable for mass production applications. 8832 / 8836 asset provides excellent relief of pattern features down to 0.35µm. It is also compatible with other ancillaries, such as stripping solvents and O2 based Dry Strip. Furthermore, it is highly stable over a wide range of processing temperatures, from -25°C to +150°C. Overall, SVG 8832 / 8836 photoresist model is an ideal solution for the fabrication of advanced semiconductor devices. It provides excellent protection from etching, thermal, chemical and radiation damage; has excellent resolution of patterns down to 0.35µm; and is highly stable over a wide range of processing temperatures. Additionally, it is a low-cost solution which is suitable for mass production.