Used SVG 8836 #293608555 for sale

SVG 8836 is a photoresist equipment made by SVG Laboratories, Inc. It is designed to be used in the lithography process of semiconductor manufacturing. The resist system is made up of several components: a photoresist, a developer, an ash and debris remover, an ash inhibitor, a surface tension modifier, and additives. Photoresist, also known as imaging resist, is a light-sensitive material that is used in lithography to transfer a pattern from a mask onto a substrate. It is a photosensitive material which reacts to a light source and forms an insoluble pattern on a substrate. The photoresist unit contains a variety of photoresists, each with its own properties and characteristics that make it suitable for different applications. The resist is applied to a substrate and then exposed to a light source. The radiation activates the chemical in the photoresist, which changes its physical properties - it becomes insoluble, forming a pattern on the substrate. After exposure, the developer is used to remove the unexposed redundant photoresist and to reveal the pattern. The developer reacts with the exposed material and forms an insoluble pattern on the substrate. 8836 then uses an ash and debris remover to remove any remaining photoresist and other types of particles from the substrate surface. This ensures a high quality pattern on the substrate. It is especially important for multilayer components, as cleanliness is critical for high reliability during operation. SVG 8836 also contains an ash inhibitor, which helps limit the reaction of the photoresist with the developer, reducing the amount of ash and debris that needs to be removed. The surface tension modifier adjusts the surface tension of the developer, allowing the photoresist to be removed more easily. Finally, 8836 contains additives, to help fine-tune the performance of the resist machine and tailor it to specific applications. To sum up, SVG 8836 is a photoresist tool designed to be used in the lithography process of semiconductor manufacturing. The asset consists of a variety of photoresists, a developer, an ash and debris remover, an ash inhibitor, a surface tension modifier, and additives. It is important for high quality and reliable components, as it ensures fine pattern transfer from a mask onto a substrate.