Used SVG 8838 VP #9183892 for sale

SVG 8838 VP is a high performance photoresist equipment designed for precision etching in semiconductor manufacturing. This system is composed of three key components: the photoresist, the developer, and the stripper. The photoresist is a type of polymer that has photo-sensitive properties and is used to mask certain areas on a substrate prior to etching. The developer is then used to dissolve the photoresist in the desired parts of the substrate, leaving the underlying material exposed and ready to be etched. The stripper is then used to remove the remaining photoresist from the wafer. 8838 VP photoresist unit provides excellent accuracy due to its low-viscosity liquid state and high resolution of 0.2 microns, allowing for extremely precise etching results. It is also fast acting due to its low-surface tension and high solubility, making it well-suited for high-speed processing. The machine features wide-ranging process control, allowing for accurate control of the developer, as well as high etch rates with low erosion levels for flexible and effective etching results. This tool is designed for multiple applications and is mostly used for single level and multi-level pattern generation, as well as for the creation of high-aspect ratio features. SVG 8838 VP also offers excellent solderability and allows for extremely fine etching and laser direct imaging (LDI). The asset features a low substrate temperature, with a temperature range of between 16°C and 28°C, which is particularly beneficial for high temperature sensitivity substrates, including GaAs and SiC. In summary, 8838 VP is a photoresist model developed for precision etching. It offers excellent accuracy and process control and provides a low surface tension and high solubility for fast acting results. Its wide range of applications make it suitable for a broad range of applications, including single level and multi-level pattern generation, as well as for the creation of high-aspect ratio features. It is also beneficial for substrates that are sensitive to high temperatures.