Used SVG 90 #293615917 for sale

SVG 90 is an advanced photoresist equipment developed by semiconductor manufacturer Shin-Etsu Chemical Corporation. The system is composed of a lithographic coating process and a patterned photomask. It is a tool used for creating intricate designs with high-resolution imaging for advanced semiconductor structures. 90 is composed of a photoresist coat that is sensitive to ultraviolet light and a photomask. The photomask is a thin sheet of plastic or glass that is coated with a pattern of photographic film. This pattern blocks certain parts of the ultraviolet light, creating a pattern that can be used to create a resist layer on the substrate. The coat of photoresist is applied to the substrate, followed by exposure of the substrate and mask to ultraviolet light. The photomask acts as a stencil, only allowing the areas that correspond to its pattern to be exposed to the ultraviolet light. The light causes a reaction in the photoresist, which then reacts with the substrate and is removed via etching or chemical washing. SVG 90 unit is capable of producing sub-micron resolutions, which allows for very fine, intricate designs. In addition, it is highly reliable and has excellent thermal stability. This ensures that it is highly resistant to etch damage and is suitable for various production methods. These features make 90 machine suitable for many types of advanced semiconductor structures. It is most commonly used in the production of MEMS (micro-electroid-mechanical systems) and also in producing nanoscale structures. Additionally, SVG 90 process is cost effective, reduces environmental impact, and has a high degree of accuracy. It increases the yield of the production process and allows for higher throughputs, which can greatly reduce costs. In conclusion, 90 is an advanced photoresist tool developed by Shin-Etsu Chemical Corporation. It is composed of a lithographic coating process and patterned photomask. This asset is highly reliable and produces sub-micron resolutions. It is suitable for many types of advanced semiconductor structures, is cost effective, and reduces environmental impact.