Used SVG 90 #9085777 for sale

SVG 90 is a sophisticated photoresist equipment derived from state-of-the-art technology adapted for use with advanced photolithography. It is designed to safely and accurately pattern complex structures on an array of substrates such as and glass, silicon, and compounds. The system uses a high resolution UV laser, controlled by an all-in-one software package which operates with precision to create microscopic shapes and patterns. The unit utilizes a revolutionary chemical-free, vectored etching process known as Laser Induced Image Generation (LIIG). This process eliminates the need for traditional chemical etching, having its own reservoir of resistive material and noxious gases. As a result, the product is efficient and cost effective for a variety of applications including the manufacturing of semiconductor devices, MEMS, and sensors. 90 features a fully automated photoresist machine and offers high repeatability and consistency in operation. It has a platform size of SVG 90 mm and can process pieces up to 200 mm in diameter. A variety of film formats is available to suit specific applications and the tool can easily reposition the film to change the pattern size. In addition to this, the unit offers automatic motorized alignment and excellent resolution handling for production of high quality patterns. The unit is equipped with an optimized illumination asset consisting of top angle lamps providing uniform exposure. It also features auto-calibration to automatically adjust exposure time and illumination level for each single shot, which improves the accuracy of patterns without additional manual adjustments. Furthermore, a quartz chamber equipped with textured surface reflectors and a UV filter ensures higher efficiency in controlling exposure. In summary, 90 is a highly advanced photoresist model designed for efficient and cost effective production of complex structures in an array of substrates. Its automated operations, precise laser exposure and optimized illumination equipment enable it to reliably produce patterns with excellent accuracy and repeatability. Furthermore, its vectored etching process and chemical-free operation is preferred for operations that demand fine and intricate shapes.