Used SVG 90S #293814156 for sale

SVG 90S is a state-of-the-art photoresist equipment for the development of ultra high resolution photolithography processes. It is designed to provide superior resolution and imaging uniformity compared to other photoresist systems. The system is based on deep-UV (DUV) projection lithography and utilizes a 6-inch reticle and film stage. SVG 90-S photoresist unit uses a 6-inch reticle pattern which is projected onto a 4x6-inch film stage. This allows for the resolution of features down to 0.19 microns. The film stage is equipped with a sub-micron stage drive and stage correction machine, enabling precise and repeatable alignment of the film to the reticle. Additionally, the off-axial alignment tool ensures that the projected pattern remains within the specified pattern range. The projection optics of 90 S are equipped with advanced features, such as diamond-turning optics, a pulse stretcher, and a curved motion compensator. The diamond-turning optics reduce the optical aberrations and ensure that the projected images are clear and accurate, even at the highest resolution levels. The pulse stretcher helps to maximize the image stability and contrast, and the curved motion compensator ensures that the projected pattern remains properly aligned with the film stage. The sensitive film used with 90S is optimized for optimal adhesion and to reduce residue and debris. This specialized photoresist will not suffer from scanning errors like other photoresist films. Additionally, the resist thickness of less than 0.1 micron allows for the production of high precision features. SVG 90 S asset is controlled by an external computer via Ethernet or USB communication. It is equipped with an intuitive software interface and provides a variety of tools and features, including array and overlay options, which allow for the design and printing of reticle patterns at the highest resolution. In conclusion, 90-S is a highly sophisticated and advanced photoresist model. It provides state-of-the-art performance in resolution and imaging uniformity, with features such as diamond-turning optics, a pulse stretcher, and a curved motion compensator. Additionally, the equipment is user friendly and equipped with an intuitive interface and specialized photoresist, allowing for the design and printing of fine-line patterns with superior accuracy and resolution.