Used SVG 90S #9206219 for sale

SVG 90S (Sub-micron Vapor-phase Growth) is a reliable photochemical vapor deposition (PECVD) system for processing high-quality dielectrics, metals, and other materials at sub-micron scale. It is typically used in a wide range of semiconductor processes such as high-k and low-k dielectric film deposition, metal sputtering, and etching. At the core of SVG 90-S is the C2 rotary reactor which can process wafers up to 25mm in diameter. It utilizes two concentric horizontal cylinders and an external tube to achieve low-pressure PECVD processing. Inside the reactor, the wafers are exposed to a precisely controlled mixture of reactant gases at a very low rate. This vaporizes the materials, causing them to nucleate and grow onto the surface of the wafer. The reactive species within the reactor are ignited by flashes of light from halogen lamps to initiate the process. Through this system, 90 S is able to achieve extremely high uniformity and conformality of the deposited films, as the vapor process allows the barriers and deposition rates to be easily adjusted over large areas without masking. This makes it ideal for both low-k and high-k deposition processes, as detailed patterns and thick films on wide wafers with extremely low critical dimensions can be achieved with minimal residual stress. The substrates remain clean as the reaction occurs at low temperatures, eliminating the risk of contamination from organic particles. In addition, 90S is fully automated by an intuitive touch-screen control panel. This allows users to easily control the film deposition rate, gas flow, and temperature with great precision. Multiple process recipes can be stored and recalled for repeatable applications, while multiple recipes can be completed simultaneously to increase productivity. SVG 90 S' ability to pattern and deposit high-quality materials at sub-micron scales makes it a versatile tool for a wide range of semiconductor applications. Its accuracy and repeatability make it an ideal choice for sub-micron-level photoresist processing, as well as covering ancillary semiconductor tasks like sputtering, etching, and contact formation.