Used SVG / AIO 86xx #9247857 for sale

SVG / AIO 86xx Series is a photoresist equipment from SVG designed for advanced semiconductor device production. The system features both scanning photoresist and spray head subsystems for superior defect coverage, throughput and high yield output in a wide range of advanced process levels. The unit is suitable for a variety of processes including multi-level patterning, sub-quarter micron features, and the ability to achieve via and interconnect formation. The machine is capable to quickly switch between full-area exposures and high precision features with fine line resolution capabilities. With up to four cassette systems, the tool is able to enable high speed throughput while maintaining yield and performance. The asset features a tight frame, low stray light illumination, low shadowing and high uniformity. It is designed to eliminate the potential of partial shadowing and improve edge acuity. The model is equipped with a four chamber spin coater/developer unit for quick and precise planarization applications and advanced chemical/mechanical treatment. A nine-axis edge generator equipment with a 0.4 micron positional accuracy helps to accurately control complex film formation. The system also includes a multi-beam laser imaging unit with output power of 2KW for fast and accurate shadowless lithography. The advanced precision optics machine features a large field-of-view for improved throughput capabilities. The optics software enables simultaneous control of photomask alignment and deformation correction, resulting in well-defined structures with higher resolution and throughput. The advanced tool control, monitoring and reporting features help to quickly provide feedback on process performance and the overall asset reliability. The model's superior thermal management capabilities ensure reliable operation and output when processing high temperature photoresists and other chemistry. Overall, SVG 86xx Series is an advanced photoresist equipment designed to provide superior yield and throughput for advanced semiconductor device production processes. It is capable of processing complex patterning with tight control and high precision for highly reliable results.