Used SVG / ASML 90 #9298643 for sale

SVG / ASML 90 is a high-end photoresist equipment developed and designed by SVG (Advanced Semiconductor Materials Lithography). This system was introduced in 1990 and it is used to create extremely precise and accurate structures on the micro level. The photoresist unit works by using light and photo-sensitive chemicals (known as photoresists) to generate patterns on the wafer. This machine uses a 193nm KrF excimer laser with a numerical aperture of 0.75 to emit a light beam that is divided into multiple laser stripes. This light beam is then used to expose a photosensitive chemical (the photoresist) that is spread across the wafer. The photoresist is then attracted to selected areas of the wafer or substrate like a magnet to iron, forming a pattern on the surface. SVG 90 tool allows for high resolution, high speed, and excellent optical performance for the manufacture of semiconductor chips. It has a patterning exposure time between 14 to 18ms, depending on the exposure field size. It uses a steep edge profile asset with a resolution as high as 0.17µm lines/spaces and has a shot-to-shot overlay accuracy of +/-2nm. The model can handle wafers up to 200mm in diameter with a high throughput of 45 to 70 wafers per hour. It also has a vertical and horizontal alignment equipment that ensures alignment accuracy of +/-7.1nm in vertical and +/-3.9nm in horizontal. In addition to that, it has a sophisticated drift and focus control system that compensates for wafer-to-wafer misalignment and that maintains consistent overlaps across the wafer surface. ASML 90 is an invaluable tool for the semiconductor industry and is a key component in the production of chips. It is capable of generating patterns with great accuracy, speed, and resolution, enabling continued progress in the electronics field.