Used SVG / ASML 90S #39180 for sale

SVG / ASML 90S
Manufacturer
SVG / ASML
Model
90S
ID: 39180
Wafer Size: 8"
Systems, 8".
SVG / ASML 90S is a widespread photoresist equipment used in the production of semiconductor chips. It is a so-called indirect exposure lithography system that employs a light-sensitive material (photoresist) to transfer onto a substrate the patterns generated by its onboard computer. The unit can be configured with up to three exposure heads. The machine is comprised of several sub-systems, specifically, a scanner, a wafer stage, a mask applicator, and a wafer loader, which are connected via a high-speed network. The scanner consists of multiple optical components, as well as a moving stage. The stage is used to move the substrate and is driven by high-precision motors. In order to pattern the photoresist, light of a specific wavelength is projected onto the substrate. A high-speed, high-resolution stage tool then makes sure that the light is accurately directed to its target at the desired intensity. The mask applicator is located within the scanner and accommodates a metal mask, which is used to project the pattern onto the substrate. The metal mask itself includes apertures and projection ports, in wherein light from the specified wavelength is used to produce the desired pattern. The wafer loader or loader/unloader consists of several components that are used to ensure that each substrate is correctly aligned and loaded onto the stage, as well as to facilitate the easy transfer of the substrate in and out of the asset. Once the substrate is on the stage and the mask is in the mask applicator, the exposure head is fired, the light beam is focused on the photoresist, and the pattern is projected onto the surface. The exposure head contains an array of sensors and controllers, which ensure that the pattern is accurately projected with the proper intensity. Finally, the wafer stage is used to unload the substrate from the model and set up the next max for the exposure process. Once the substrate is unloaded, the exposure process is repeated until the desired pattern is produced on the substrate. SVG 90S photoresist equipment is ideal for high-volume production runs, as it is capable of producing precise and consistent results.
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