Used SVG / ASML 90S #9214756 for sale

SVG / ASML 90S is a state-of-the-art Photoresist equipment developed by SVG, the world's leading provider of lithography systems for the semiconductor industry. This system is designed to provide a reliable method of patterning wafers for deep-submicron processes. SVG 90S utilizes highly accurate and sensitive laser light for exposure of a photo-sensitive resist material. With the help of movable mirrors, the projection optical unit projects topographical patterns in photoresist layer onto the substrate, this allows the creation of microscopic structures with very high precision. In order to reach sufficient exposure uniformity, an internal feedback loop within the projector machine is employed to continuously measure the actual exposure and compensates accordingly. ASML 90S is also equipped with a special Argon Fluoride gas (ArF) laser with an emission wavelength of 193nm. This wavelength is optimal for efficiently exposing the layer of resist in a deep submicron process. In addition, wafer alignment is achieved with an inclination guide tool which scans the surface of the substrate and instantly transmits the position's data back to the Software to adjust its beam. To provide seamless compatibility with various substrates, 90S also comes with a full-range of (un)mounted cassettes, spin-chucks, and wafer-handling accessories, all of which use a Highly Accurate Connect (HAC) asset allowing toolless replacement. All these components ensure extremely precise transfer of the wafer from the cassette to the exposure head. What makes SVG / ASML 90S stand out from other photoresist systems is that it offers real-time printability analysis. This ensures process optimization, an integrative quality-control platform and further reduces running costs. In addition to changing parameters, other features include backup and restore of product data, protection for your recipes and software updates. SVG 90S is an important step towards achieving higher precision in photolithography, and has revolutionized the art of patterning deep-submicron processes. Despites the initial investment, this model offers versatile, reliable and cost-effective patterning solutions in order to drive more efficient production and subsequently higher yields.