Used SVG / ASML 90S #9298645 for sale

SVG / ASML 90S is an advanced photoresist equipment used for optical lithography and microprocessing. It uses cutting-edge imaging techniques to transfer designs from one film to another. SVG 90S employs a pattern generator and laser scanner to generate and project ultrafine images onto a photomask. The photomask is then exposed to an ultraviolet light source to transfer the image onto a photoresist-coated substrate. The photoresist acts as a mask, allowing some areas to be exposed and preventing others from being exposed. The system is accurate to angstrom-level: it can render microstructures down to 1 nanometer in size. ASML 90S unit uses a proprietary chemical, SVG Resist™, to further facilitate the resolution of delicate structures and microdevices. The Resist is specially formulated to be photosensitive to the laser scanner's light, resulting in an increase in effectiveness for delicate structures. In addition to its high resolution capabilities, 90S machine is also extremely fast. It can expose photoresist-coated substrates within seconds, allowing for rapid and reliable production of large volumes of components. The combination of speed and precision makes SVG / ASML 90S tool ideal for producing a large range of components, including transistors, biosensors, and microelectromechanical systems. The asset is also frequently used in high-precision fields, such as the health, automotive, and aerospace industries, where precision and speed are essential. Overall, SVG 90S photoresist model is an extremely precise, fast, and effective method of producing delicate components for a variety of industries. Its combination of speed and resolution makes it an ideal choice for laser lithography and microprocessing applications.