Used SVG / ASML 90S #9314698 for sale

SVG / ASML 90S is a laser photoresist equipment used in semiconductor manufacturing. It is used to define the patterns for lithography and other fabrication processes. SVG 90S system uses a laser to expose a photosensitive coating applied to a substrate. The laser light is directed onto the substrate through a series of lenses and mirrors which create the desired pattern. The substrate is then developed to form a resist that will stop part of the exposed material from being removed in later stages. The laser light is first amplified by a neodymium-doped yttrium aluminum garnet (Nd:YAG) crystal, and determined by a computer-controlled scanner. The YAG laser further induces photoelectric effects to the exposed photoresist creating small cross-sectional non-uniformity in the exposed region. These features, as well as the intensity of the light, can be altered to adjust the performance of the photoresist in the production process. The laser is then focused onto the wafer using a series of lenses. A variable numerical aperture (NA) unit allows different shapes and sizes of patterns to be formed on the photoresist. A beam splitter can also be used to increase the exposure resolution. The focus of the laser can be controlled by an automated wobble mirror machine to ensure that the exposure is correctly applied across the entire wafer. ASML 90S tool is used in conjunction with deionized water bath exposed resist removal, Steagall-lift-off and post-exposure bake systems. This asset can be used to create high-precision lithography patterns with development times ranging from just a few seconds to upwards of several minutes. These patterns can range from large (VLSI) features to the smallest microelectronic circuits. 90S model is widely used in the semiconductor industry to create lithography patterns for fabrication processes. The equipment provides precise and consistent exposures with minimal energy loss, allowing for the best possible results in production. Its capability to produce uniform patterns with extremely small feature sizes has allowed for the creation of complex and advanced microelectronic devices.