Used SVG / RITE TRACK 8800/8836 #9165921 for sale

ID: 9165921
Wafer Size: 6"
Track system, 6" (3) Post exposure bakes.
SVG / RITE TRACK 8800/8836 is an automated photoresist equipment designed to be used for patterning and developing of precision features onto semiconductor substrates. This system can be used in semiconductor fabrication processes such as photolithography, etching, chemical-mechanical planarization, doping, and metal deposition. SVG 8800/8836 unit utilizes a dual track machine for precision photo-patterning and resists development. This tool's first track is designed for precise patterning of custom features on the wafer while the second track is used for processing and developing resists. The asset supports development and patterning of a variety of functional materials, including thermal oxide, WBC oxie, GaAs, SOI, NiSi, polyimide, and many other materials. RITE TRACK 8800 / 8836 model contains a highly advanced laser equipment for patterning and a precise placement stage for wafer handling. The laser system utilizes two micron slit optics and features optional beam alignments for improved patterns and increased stability. In addition, the unit features a variable temperature zone for quick cooling and heating, as well as a liquid crystal panel for easy wafer navigation. The entire machine can be placed within a compact, single-piece body to better facilitate the development process. This feature allows for ease in positioning the tool on a cleanroom floor and reducing the amount of time required for setup and reconfiguration in multiple processes. A variety of options, such as the advanced thermal management cooling asset, are also available to meet customer specifications. SVG 8800 / 8836 is a vital tool for creating the most accurate and precise patterns, for use in the toughest of semiconductor applications. It offers easy-to-use functional tools to quickly customize and configure processes with great accuracy. This model is ideal for high-volume production environments that require precise patterning and precision resists development.
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