Used SVG / RITE TRACK SVG 90 S #9179395 for sale

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ID: 9179395
Wafer Size: 6"
(2) Coaters / (2) Developers system, 6" (4) Loaders for cassettes HMDS Module (4) Chill plates (5) Hot plates Temperature bath controller Semifab air flow controller Linear single center robot Full enclosure With charcoal filter system Control cabinet: Height: 66” Width: 13” Main chassis: Length: 142" Width: 54" Height: 98" Currently stored in cleanroom.
SVG / RITE TRACK SVG 90 S is a photoresist equipment from RITE TRACK DLE, Inc., that functions to produce intricate semiconductor circuits. Developed for use in both commercial and research-based photolithography processes, the system works using an attractive evaporation coating technique applied to a hardened-wood surface. This coating process forms an accelerated version of the usual photoresist coating process, allowing entire patterns of structured metallization to be produced at higher speeds and resolutions than would otherwise be possible. The process of using the SVG/Rite Track SVG / RITE TRACK 90 S unit begins with patterned circuit designs being transferred to the photomask via digitized micro-computers. A layer of inerting gas is then applied to the photomask to prevent oxidation and produce a protective barrier. The exposed surface of the photomask is then sprayed with a chemical sensitivity enhancement layer of photoresponsive material to facilitate the next stage of the process. Light energy is then focused onto the photomask surface, which triggers a chemical reaction that causes the photoresponsive coating to harden. This hardened coating allows for the uniform transfer of the desired design pattern onto the hardened-wood substrate. The photoresist can then be further developed through a variety of methods based on the desired layer of material to be generated. SVG SVG 90 S also includes an automatic thickness control machine, which produces ideal layer thicknesses as specified by the user. Furthermore, the tool allows for closely monitored and adjustable process parameters, ensuring that the photoresist layer conforms to the project-specific constraints. In summary, the SVG/Rite Track RITE TRACK 90 S is a photoresist asset designed to quickly and accurately generate complex semiconductor circuit patterns. Its attractive evaporation coating technique and automated model parameters enable users to produce high-quality, intricate results at higher resolution than traditional photolithography. Together, these advantages make the SVG/Rite Track SVG / RITE TRACK 90 S an ideal choice for commercial and research-based photolithography processes.
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