Used SVS CIE-DV3-028 #9364592 for sale

SVS CIE-DV3-028 is a photoresist equipment used in photolithography to produce nanoscale structures, thin films, and other patterns on a substrate surface. Photoresist is an organic material that is applied in a thin layer and exposed to light, which causes a chemical reaction whereby only the exposed areas of the photoresist are removed or altered. The remaining areas, or patterned features, form the basis of a wide range of materials processing operations. CIE-DV3-028 is a type of novolak-based positive photoresist system, consisting of a photoresist, developer, and developer enhancer. The novolak-based photoresist unit offers superior resolution, definition, and image fidelity when compared to other photoresist systems. The machine is optimized for 193 nm, 248nm, and other DUV and EUV exposure wavelengths. SVS CIE-DV3-028 tool utilizes proprietary acid chemistry to improve resolution. This allows for tighter features with low (<1%) bridge width. Additionally, it is one of the thinnest photoresist systems on the market, with a thickness of just 0.2μm when cured. This property offers improved development uniformity across the substrate surface, which is especially beneficial for high-resolution lithography processes. In terms of process flexibility, CIE-DV3-028 photoresist asset can be used in conjunction with both wet and dry develop processes. The model also offers improved post-exposure cures and thermal reflow. Users can expect excellent protection against edge beads, voids, and contamination as the equipment facilitates repeatable etch processes. SVS CIE-DV3-028 system is also highly reliable; the unit's robust imaging capability provides uniform, reliable patterning performance across environmentally challenging conditions. This is beneficial for situations where temperature, humidity, or other processing parameters have a high degree of variability. Overall, CIE-DV3-028 machine offers a range of advanced features that make it an ideal choice for a wide range of photolithography applications. The tool's superior resolution and reliable performance makes it a reliable choice for the development of nanometer-scale patterns and other features for the semiconductor industry.