Used SVS MSX-1000 #9364566 for sale

SVS MSX-1000 is a photoresist equipment developed by Swedish Vacuum Systems (SVS) that integrates a full range of innovative technologies including advanced vacuum systems, imaging technology, and robotics automation. The system is based on advanced vacuum technology which combines a number of interconnected components into a single integrated unit. It utilizes a combination of high-speed two-dimensional imaging, vacuum extraction, and vacuum application to ensure repeatable and reliable results. The machine utilizes a unique semi-automated process which enables higher throughput levels with respect to deposition and development of resistive thin films and MEMS components. The tool's imaging technology, which allows for detailed imaging of substrates and patterns to ensure an accurate deposition process, supports both standard optical lithography and novel patterning techniques. It is capable of imaging substrates of up to 500mm2 in size and features an array of imaging modes, ranging from contact to Extreme Ultra-Violet. The asset also features an active backlighting functionality, which can be used to enable contrast imaging and backside illumination. The vacuum model is able to transfer materials and liquids rapidly and accurately while providing high levels of accuracy and repeatability. Its various components include a robotic arm for automated transfer of parts, a thermal evaporator for depositing thin films, and a sputtering equipment for depositing metals. The combined effect of SVS MSX 1000's advanced features is that it enables the precise and consistent deposition of protective photoresist layers for planarization or for subsequent processing. By combining the imaging and deposition capabilities of the system, it is possible to create repeatable features with consistently high quality micro-scale patterning down to the sub-micron level. Additionally, MSX-1000 offers comprehensive software support that enables the precise control of the deposition process and the analysis of images. This ensures the optimal adherence of photoresist layers and the highest possible resolution of the applied images. MSX 1000 is a powerful photoresist unit designed to optimize the deposition of protective layers and the precise application of micro-scale patterns to a range of substrates and materials. It features a wide range of innovative features such as advanced vacuum systems, imaging technology, and robotics automation that make it an ideal choice for a variety of industrial applications.