Used SVS MSX-1000 #9409621 for sale

SVS MSX-1000 is a photoresist equipment designed for the use in various scientific and industrial applications. It is a type of photoresist material produced from a specialized point-contact silicon processing environment. This system uses a combination of ultra-high resolution, precision photolithography and high-resolution ultra-violet (UV) curing for the ultimate in photoresist patterns. SVS MSX 1000 unit operates at up to 0.5 microns and has a full range of the performance parameters associated with complex photolithographic processes. It is capable of creating feature sizes down to 5 microns in addition to creating interconnects into the range of 10 microns. It can also produce microfabricated components with a resolution of 1 micron. To achieve high-resolution features, a precision point-lens imaging machine is used. This results in fewer defects compared to similar systems that employ area exposure techniques. Furthermore, the use of a continuously variable illumination aperture size allows for submission to optimize the exposure and gain further precision in feature size control. The photoresist technology used by MSX-1000 allows for faster processing times and the advantage of repeatability. This is because the photoresist is chemically processed, rather than structurally exposed. This ensures that there is less scope for macromolecular variation. The tool also allows for post-processing, chemically curing the materials to make them hard and resistant to stress such as mechanical impact and organic solvent exposure. MSX 1000 photoresist asset is capable of producing high-resolution features while ensuring minimal image distortion. The use of chemical processing is also beneficial and ensures the repeatability of production and securement of high-quality results. Furthermore, it is designed to provide fast turnaround times which makes it ideal for applications which demand precise and detailed results.