Used SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000-3C #9358813 for sale

SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000-3C photoresist equipment is a robust and reliable tool ideal for managing complicated lithography processes. It offers a highly reliable and cost effective solution for high volume production environments. SVS MSX-1000-3C utilizes a unique negative tone, circumbinary photovoltaic (PV) resist to allow manufacturers to take advantage of the superior resolution and light stability of negative tone photoresist processes. The system features a three-source resist detector that offers a reliable level of photovoltaic detection and advanced-level lithography capability. The unit is capable of handling a wide range of substrate sizes and thicknesses, and provides a cost-effective solution for large-scale volume production of chip components and devices. SCIENTIFIC VALUE SOLUTIONS MSX-1000-3C utilizes a scanning electron beam (SEB) optical scanner to create an image or pattern on the negative tone, circumbinary, PV resist. The SEB optical scanner is capable of controlling the beam pattern, scanning speed, and exposure levels accurately for a wide range of substrate sizes and thicknesses. Furthermore, MSX-1000-3C is designed to create high resolution images with a maximum resolution of 25 microns per linear inch (0.0881mm/inch). The machine is also equipped with an advanced wafer surface analysis suite, which can be used to detect material defects and anomalies. SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000-3C includes a powerful substrate processor, providing advanced process control and automation to ensure consistent image quality. The processor can store up to six preset patterns and three substrate sizes. It also features adaptive exposure control with adjustable time-to-exposure, as well as a fast scan time and photoenergetics mapping capability. In addition, the processor utilizes advanced imaging algorithms and mathematical modeling to ensure optimal lithography accuracy. In addition, SVS MSX-1000-3C photoresist tool includes robust software that automates the lithography process. The software allows users to control the scanning speed, exposure levels, image quality, and exposure time. Furthermore, the software provides an intuitive graphical user interface for easy navigation and provides an extensive library of flexible programs. These programs allow users to design and analyze patterns quickly and accurately while maintaining process repeatability and robustness. Finally, SCIENTIFIC VALUE SOLUTIONS MSX-1000-3C photoresist asset offers a wide range of diagnostic and support tools. The model includes an intelligent maintenance equipment that monitors the system health and makes appropriate calibration adjustments. Furthermore, it includes secure access software for archived process data and repairs, and provides comprehensive technical support. The secure access software ensures that all data is securely stored and backed up to reduce downtimes.