Used SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000 #293655273 for sale

ID: 293655273
Wafer Size: 2"-4"
Vintage: 2012
Spin coater, 2"-4" 2012 vintage.
SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000 is a vision-based, micro-photolithography equipment featuring precision resist coating and custom-tailored solutions for photomask processing. Developed for semiconductor applications, this advanced photoresist system provides unmatched performance and accuracy. It easily supports complex multi-layer mask structures through its capacity for advanced pattern transfer and supports processes from 100nm to 1.2µm. SVS MSX-1000 is a fully automated resist coating unit with the ability to apply both thick and thin resist layers. It features a range of industry-standard resist types which can be applied precisely and with an excellent ratio of uniformity on the lithography coating uniformity (LCU). With its powerful precision resist coating, SCIENTIFIC VALUE SOLUTIONS MSX1000 is well-placed to deliver significant operational savings and fast track production of advanced patterned wafers. MSX-1000 also offers higher throughput by utilizing advanced mask design tools for rapid water fabrication. In addition to providing high quality single-mask solutions, SVS MSX1000 is capable of producing multiple mask operations. In this way, SCIENTIFIC VALUE SOLUTIONS MSX-1000 provides a complete solution for mixing and matching multiple resist coatings for application to mask substrates with the utmost precision. The machine also offers the capability of applying multi-layer Resist patterns to varied substrates including, but not limited to, quartz, glass, chrome, and direct-gate silicon materials. It also features resist stripping and dry etching features that enable the complete removal of resist profiles. With its advanced lithography tool, SVS / SCIENTIFIC VALUE SOLUTIONS MSX1000 provides superior results for complex microfabrication processes. The asset also packs exclusive and world-leading features such as powerful data compression and transfer capabilities, photo-tool blending combined with CAD-controlled auto-correction, and 4D motion control. In order to guarantee the best results, MSX1000 can be set up to work in conjunction with other high end systems that complement its features, such as stereo-lithography systems and laser developing systems. SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000 is an ideal platform for the production of high-end and ultra-high-end devices. Throughout its manufacturing processes, this model ensures that the highest quality wafers are produced. The combination of its features, such as adjustable coating programs, powerful pattern transfer, uniformity for multiple-materials and extensive data transfer capabilities, offers unprecedented performance and precision. This unprecedented performance makes SVS MSX-1000 an ideal choice for photoresist production.
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