Used SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000C #9244973 for sale

SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000C
ID: 9244973
Systems.
SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000C Photoresist Equipment is a cutting-edge system that is used for creating high-quality photomasks for the microchip and photonic device industries. It provides users with maximum productivity, flexibility, and accuracy when performing photomask processing tasks. SVS MSX-1000C utilizes a 4-beam mask alignment unit, consisting of laser projectors and sensing cameras, for automatically aligning stencil masks onto the substrate wafer. This ensures accurate reproduction results and increases throughput otherwise not achievable with manual alignment. Additionally, advanced vision systems are installed on the mask aligners that enable automatic substrate plate alignment and identification, as well as automatically-corrected mask position errors. SCIENTIFIC VALUE SOLUTIONS MSX-1000C features variable-angle and reduction/magnification exposures, as well as an integrated pre-exposure correction machine. Other technologies included with this tool are Automatic Wafer Positioning Detection (AWPD) and Edge Detection (ED). These technologies allow for greater accuracy in production runs, more consistent batch-to-batch results, and the ability to produce masks with higher resolution and better control over line widths. In addition, MSX-1000C includes advanced cleaning and drying technologies that impose minimal contamination or distortion upon the contact surface of the wafer. Furthermore, temperature and humidity controlled environments help to reduce the distortion and thermal stress experienced by the mask and substrate during its fabrication process. SVS / SCIENTIFIC VALUE SOLUTIONS MSX-1000C can accept a wide range of materials, including polysilicon, silicon nitride, metals, and glass. It can also accommodate substrates up to 5 inches in diameter, allowing for high-volume processing in short amount of time. Overall, SVS MSX-1000C Photoresist Asset offers maximum accuracy, control, and flexibility in photomask processing. It is an ideal solution for manufacturers looking to achieve global precision and improve process yield in a rapid, cost-effective manner.
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