Used TAKADA TWPS-064-TJ #9266615 for sale

TAKADA TWPS-064-TJ is a negative-acting photoresist system designed for application in the field of micro and opto-electronic device fabrication. It offers superior etch resistance and resolution, and is suitable for both thick film and thin film photoresist processes. The photoresist is composed of a negative-acting acid-designed formula, which allows for rapid crosslinking at the acid site upon exposure to UV light. This feature enables high-resolution etching of very fine patterns, making it ideal for micro and opto-electronic device fabrication. The photoresist is available in the form of a paste-type liquid with a viscosity of up to 1.4 poise. It can be applied to the substrate using a doctor blade, silkscreen, or spin-coating method. Once the resist has been applied to the substrate, it can then be exposed to UV light using either a reflective mask or a non-reflective mask. When exposed, the exposed areas of the resist undergo rapid crosslinking due to the acid-based formula, creating a polymerized structure that offers superior etch resistance. This ensures that only the exposed areas of the resist will be affected during the etch process. As a result, highly precise and intricate patterns can be realized. After exposure, the photoresist will need to be developed and baked to complete the process. The development process removes the exposed but unexposed areas of the resist, and the baking process ensures the acid-based reaction is complete and removes excess solvents and uncrosslinked components of the photoresist. TWPS-064-TJ is a reliable and highly efficient photoresist system that offers superior etch resistance for precise and intricate patterns. With its acid-based formula, it offers reliable and repeatable results for a wide range of micro and opto-electronic device fabrication. The paste-type liquid is easy to apply to the substrate using a doctor blade, silkscreen, or spin-coating method. It can then be exposed to UV light, developed, and baked for reliable and repeatable results for intricate and high-resolution patterns.