Used TAYLOR WHARTON 24 K-Series #9076806 for sale

TAYLOR WHARTON 24 K-Series
ID: 9076806
Cryostorage System Chamber Temperature range: -100°C to -196°C Volume: 12.7 cu ft Capacity: 365L.
TAYLOR WHARTON 24 K-Series is a photoresist equipment created for industrial and laboratory use. This system is capable of accurately etching and developing coated or uncoated photoresist materials. It uses a highly sophisticated 5-axis stepper motor unit to ensure accuracy and precision when etching and developing photoresist films. The machine is also equipped with UV and visible light sources to enable accurate development of the photoresist materials. 24 K-Series also features a large, industrial-grade vacuum chamber for removing contaminants and for controlling process parameters. This chamber is equipped with powerful vacuum pumps which allow for consistent and repeatable results. The tool also features a powerful motor-driven conveyor for automated positive or negative development, as well as a special diffuser plate to spread the light from the UV and visible light sources for even and consistent development of the photoresist material. TAYLOR WHARTON 24 K-Series is designed to provide precise and consistent results when etching and developing photoresist materials. It is designed to be used with a range of photoresist materials, from soft film to hard film, and it is capable of precise scaling and locking of film heights. The stepper motor and vacuum controller further ensure precise and accurate results. It is also designed for use in extreme environments, with temperature and humidity sensors to protect the asset from damage due to extreme temperatures and humidity levels. The advanced design also allows for accurate control over the processes such as exposure, developing, baking, and washing cycles. 24 K-Series is capable of etching and developing at a wide range of speeds, from 10 to 150 microns per hour, allowing for swift processing of multiple films. Overall, TAYLOR WHARTON 24 K-Series is a reliable and advanced photoresist model designed for industrial and laboratory use. It provides precise and consistent results when etching and developing photoresist films. The advanced design and components of the equipment ensure consistent and accurate results, even in extreme temperature and humidity conditions. The variable speeds available with the system also make it suitable for a wide range of films and applications.
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