Used TAZMO TZP #148486 for sale

TAZMO TZP is an industry-leading photoresist system designed to meet the demands of a wide range of photolithography and printed circuit board (PCB) fabrication applications. It uses a high-performance fluorinated polymer with a low molecular weight, creating a thinner photoresist layer and improved image resolution when exposed to UV light. The polymer is dispensed in liquid form, and needs to be applied to a substrate before baking at a specific temperature. Once exposed, the photoresist layer converts to a soluble polymer, which can be easily removed with a suitable solvent or alkaline developer. The remaining photoresist layer is then protected by a vapor-deposited reflow layer, which creates an evenness throughout. The use of a vapor-deposited reflow layer also greatly increases the overall floatability during exposure. TZP's excellent exposure performance is the result of three key features: high adherence to the substrate, low surface tension, and excellent stability in high temperatures and chemical handling. The high adherence prevents the photoresist from peeling, which has been a common issue with other photolithography systems. The low surface tension enables superior image resolution, and the excellent stability in high temperatures and chemical handling allows for more consistent processing and greater reliability over time. TAZMO TZP has been optimized for use in PCB fabrication, providing excellent image consistency and repeatability, even in the most advanced print and etch processes. It is also highly tolerant to high-temperature and chemical processing, ensuring reliable operation and cost-effective production. Additionally, the use of a fluorinated polymer also reduces the chance of copper blooming, and prevents the formation of undesirable seams and filaments during the etch process. TZP photoresist system provides excellent material performance and dependable production, and is an ideal choice for many photolithography and PCB fabrication applications. With its superior exposure performance, excellent stability, and reduced copper blooming, TAZMO TZP photoresist system provides reliable results with every application.