Used TEL / TELIUS Immersion #9267456 for sale

TEL / TELIUS Immersion is a photoresist system characterized by deep penetration of light, allowing for more precise resolution in high-density photolithography. It is used in the microfabrication of integrated circuits as well as microelectronic components. TEL Immersion utilizes a photoresist material, which is a polymer film sensitive to specific wavelengths of light. Light applied to the photoresist creates a change in its properties that allows for the desired pattern to be etched into a substrate. By immersing the photoresist in a fluid, more light is able to penetrate the photoresist, increasing the depth of field and resolution. TELIUS Immersion has several advantages compared to traditional photolithography. It is much more efficient due to its increased depth of field, and is capable of producing higher precision images with increased levels of accuracy. It is also extremely cost-efficient, as it does not require additional chemicals or expensive equipment, making it ideal for mass-manufacturing processes. Additionally, its shorter process time allows for faster production of integrated circuits and other microelectronic components. Immersion process begins by depositing a layer of photoresist on a substrate, which has been previously cleaned and treated. During the exposure step, it is illuminated with a light source, such as a laser, exposing the photoresist where desired. The penetrated regions of the photoresist experience a change in its property, allowing for resist removal in the subsequent etch step. This results in the pattern or design etched into the substrate. Finally, the photoresist is removed. After inspection, the substrate may then be processed further or used as is. TEL / TELIUS Immersion provides the advantages of high resolution and accuracy, fast and cost-efficient production, and minimal waste of materials.