Used TEL / TOKYO ELECTRON ACT 12 #293610279 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment designed for critical lithography processes. This system features advanced performance-level features and components which enable its users to produce high precision, high quality printed pattern. The unit consists of a combination of precision alignment stages, auto-positioning software, and real-time exposure control modules. The machine's dual plate stage can tilt, rotate, and adjust the Z-axis. The alignment stages are equipped with a suite of precision encoders and closed-loop alignment systems for accurate measurement of the exposure field's size and position. The auto-positioning software allows the entire tool to be configured for complex exposure patterning. The asset also features a multi-zone exposure mode, which can be used to precisely control multiple exposure areas. This mode can be used to create intricate exposure patterns with higher resolution than traditional single exposure techniques. Furthermore, the multi-zone mode can be used to reduce the exposure time required for a particular exposure pattern by breaking the pattern into multiple exposure areas. The model is also equipped with a real-time exposure control module, which is used to monitor the exposure field and ensure that exposure parameters remain within an acceptable range. The equipment's optical unit makes use of an LED-based irradiating system that can provide high intensity exposure. This unit is capable of producing exposure levels up to two hundred times brighter than most traditional exposure systems. The machine also includes a selection of software tools for exposure control and data analysis. These tools provide the user with the ability to fine-tune exposure conditions and monitor the exposure field for potential issues prior to actual exposure. TEL ACT 12 is an advanced lithography tool for those who require a high level of accuracy and precision in their printed patterns. The asset's multiple components and precision-focused designs make it a viable option for high-end lithography operations.