Used TEL / TOKYO ELECTRON ACT 12 #293630207 for sale

TEL / TOKYO ELECTRON ACT 12
ID: 293630207
Vintage: 2003
System 2003 vintage.
TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment designed to automate the process of photolithography. This technique is targeted for the production of integrated circuit wafers by allowing a mask to ship a precise pattern on a thin film of material, called a photoresist. The major features of TEL ACT 12 photoresist system include a sophisticated electron beam writing unit, and a second-generation contactless dry development machine. The electron beam writing tool is used to create the patterns on the photoresist film. This is done by focusing a beam of high-frequency electrons onto the film, allowing for the exposure of a high-resolution pattern on the substrate. This allows for a high degree of accuracy and precision in the production of the patterns. The asset includes a programmable set of write parameters, enabling the user to control various aspects of the exposure process. The second-generation contactless dry development model is especially useful for increasing throughput and minimizing the occurrence of pattern distortion. This equipment makes it possible to transfer a high-resolution pattern to the photoresist during the development process. This is done by using a liquid with an appropriate solvent to dissolve the photoresist from the substrate, while the pattern is maintained due to the adherence of the solvent to the photoresist. TOKYO ELECTRON ACT12 photoresist system also features a superior precision alignment unit. This ensures that the alignment of the mask with the substrate is accurate, minimizing the chances of errors in the printed pattern. Additionally, the machine is equipped with an advanced optical OCR tool, allowing for the precise reading and printing of data on the substrate. In conclusion, ACT 12 photoresist asset is an advanced, automated photolithography model. It is designed to provide high levels of accuracy and precision in the patterning process, and utilizes advanced electron beams and contactless dry development technologies to maximize efficiency. Additionally, the superior precision alignment equipment and optical OCR system ensure the accuracy of the printed patterns, making TOKYO ELECTRON ACT 12 a great choice for all of your semiconductor patterning needs.
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