Used TEL / TOKYO ELECTRON ACT 12 #9042727 for sale
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ID: 9042727
Wafer Size: 8"
(2) Coater / (4) Developer track system, 8"
(2) BLK
(2) CT
(2) ADH
(6) CPL
(8) LHP
(4) CHP
(1) WEE
IF CSB(R)
Currently warehoused.
TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment used in semiconductor manufacturing. It is made up of three major components: a submersion-type chamber, a high temperature baking system, and an auto-aligner. The unit is ideal for managing a multitude of photoresist processes, ranging from spin coat, bake, pre-bake, and development processes. The chamber within TEL ACT 12 is a pneumatically-operated, closed-loop, submersion-type. It is pressure-resistant and provides a secure environment for the processing of photoresists. Additionally, the circulation nozzle ensures even distribution of photoresist solution. This eliminates the need for mechanical stirring. The high-temperature baking machine provides uniform heating of wafers. It is powered by a single heater and uses a single stage, thermal zone baking controlled by a programmable cluster. Its temperature settings are well-suited for multi-stage temperature baking of photoresists. The auto-aligner quickly measures and aligns photomasks to the proper position. It is equipped with anauto-aligner driven by a precision motor. The wide-field vision used minimizes errors and misalignments. Additionally, an automatic wafer-position control is used to ensure that the proper alignment takes place. Overall, TOKYO ELECTRON ACT12 is suitable for photoresist application processes. Its pressure-resistant chamber results in secure, low-pressure processing. Additionally, its high-temperature baking tool can provide multi-stage temperature baking. Finally, its auto-aligner enables quick and accurate mask-to-wafer alignment. Together, these components make this photoresist asset an ideal choice for sensitive semiconductor manufacturing processes.
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