Used TEL / TOKYO ELECTRON ACT 12 #9112100 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment used for lithography that is highly versatile and reliable. The system provides users with excellent resolution and stability within the nanometer range. With an adjustable scan-speed and shot-to-shot repeatability accuracy, TEL ACT 12 is capable of producing top-quality surface etching and patterns on wafers and other substrates. The unit comprises of high-quality optics, shutter-lock systems, and lens elements that reduce flare and distortion and improve focus resolution. The optics offer stable and uniform illumination of the substrate, resulting in precise lithography. Additionally, the machine is designed to allow users to precisely control the exposure pattern and dose on the substrate. TOKYO ELECTRON ACT12 also features an integrated wafer loading and unloading mechanism that is fast and reliable. This allows for multi-shot lithography and higher throughput. The advanced imaging tool also allows for the selection of different exposure masks to achieve higher patterns fidelity. This makes it possible to produce higher precision and feature sizes without distortion. In addition, the asset includes precise stage and drive systems as well as an easy-to-navigate graphical user interface. The stage ensures consistent and accurate movement along the X, Y and Z axes, and the drive enables precise control over exposure times and output power. The graphical user interface enables users to easily select desired settings and customize each process. TEL ACT12 is designed to reduce the time and effort necessary to properly produce surface etching and patterns. Its excellent optics, shutter-lock model, and lens elements provide users with the ability to achieve sophisticated patterns with higher yields. Additionally, the integrated wafer loading and unloading mechanism allows for faster and more reliable multi-shot lithography. With its advanced imaging equipment and stage and drive systems, ACT 12 offers users an efficient, reliable and precise photoresist system.