Used TEL / TOKYO ELECTRON ACT 12 #9142701 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment designed for critical device fabrication processes. It is a chemical vapor deposition (CVD) tool that is used to deposit thin layers of photoresist onto substrate wafers. The process begins by first loading the wafers onto the system, which then aligns and transports them into a vacuum chamber. The chamber houses an Electron-Asist Source (EAS), which generates an electron beam to activate a gas-phase reaction for the photoresist deposition. The unit also comes equipped with the Microparticle Image Signal Processing (MISP) machine, which measures thin film characteristics of nano-particles, and the Electron Cyclotron Resonance (ECR) device, which helps maintain a stable atmosphere for the deposition process. The ECR further helps mitigate plasma instabilities in the chamber due to pressure difference from the outside and inside of the chamber. The gas reactor then introduces the appropriate mixture of photoresist and reactant gases into the process chamber. The photoresist is exposed to the electron beam and gas-phase reaction to create a uniform thin-film layer on all the wafers. The thickness of the film layer is controlled using a rotation monitor which allows for accurate pulse duration at any given rotation angle. This tool provides excellent safety standards, monitor systems, and a range of components that are designed to deliver high quality thin-film layers. It is widely used in advanced lithography and etching processes, such as nano-imprinting, tape transfer, semiconductor deposition and packaging, and can be used with a variety of photoresist materials. It has the capability of processing up to 600mm wafers in a single run, making it ideal for high volume device fabrication processes. TEL/TOKYO ELECTON TEL ACT 12 is a reliable and advanced CVD asset capable of producing high quality thin-film layers quickly and efficiently. It is versatile and able to process various photoresist materials, which ensures that it can be used in a variety of device fabrication processes. Thus, it is an indispensable tool for device manufacturers looking to produce precise components with reliable thin-film layers at a fraction of the cost.