Used TEL / TOKYO ELECTRON ACT 12 #9152987 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment designed by TEL, a global leader in semiconductor process technologies. This system provides manufacturers with a powerful platform to accurately pattern the most difficult 3D structures that are essential for next-generation devices. TEL ACT 12 unit combines advanced photolithography technology and processes with comprehensive photomask and substrate monitoring/control. The platform is equipped with two pattern generators, including a master and slave pattern generators. The master pattern generator is equipped with a 12 inch ellipsometer which allows for imaging of resists with a high fidelity image. The master and slave pattern generators are connected to the data processing unit, which provides comprehensive control and monitoring of the exposures. The data processing unit is responsible for delivering the desired exposure parameters to the pattern generator, as well as monitoring the exposure parameters. TOKYO ELECTRON ACT12 has the ability to produce images with superior exposure uniformity and stability. This platform can handle photoresists with thickness as low as 10nm, making it suitable for advanced device manufacturing, such as FinFETs. The architecture of the machine is also equipped with an automated focus and level (AFAL) and fine tune focus capability, which ensures optimal image contrast. The platform supports non-chemically amplified (NCA) resists and standard wet resist processes, which enable high level resolution and precision. It also allows for single or multiple layer exposure, as well as the ability to use spin-on component (SOC) materials for applications where special resist properties are required. TEL / TOKYO ELECTRON ACT12 has a highly intuitive user interface, which simplifies the operation of the tool and reduces the necessary setup time. Functionality such as automated substrate temperature control and exposure monitoring give users the assurance that the exposure parameters are within the specifications. Moreover, the asset is equipped with a glitch detection model which captures and stores data related to substrate, mask and exposure parameters that could cause unacceptable patterns. TEL ACT12 provides manufacturers with a reliable photoresist platform to produce the most demanding micro structures with utmost accuracy. The combination of powerful pattern generators, automated systems and process monitoring guarantees the best possible performance for exposing films up to 10nm thick. This equipment is a great tool for advanced semiconductor manufacturing, as it offers a great level accuracy and control.