Used TEL / TOKYO ELECTRON ACT 12 #9164111 for sale

TEL / TOKYO ELECTRON ACT 12
ID: 9164111
System Currently installed.
TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment designed to etch and develop thin film electronics, such as Integrated Circuits (ICs), Liquid Crystal Displays (LCDs), and Light Emitting Diodes (LEDs). It utilizes a fast, high-precision optical imaging process to create dynamic patterns and structures. The system features a powerful lithographer which generates accurate and repeatable results, even on the most intricate designs. The photoresist unit consists of a specialized camera, two layer development chambers, two pre-bake chambers, a spin-coater machine, and a rotating exposure chamber. The camera tool uses a specialty lens to capture and digitally enhance the photosensitive material on the substrate. These images are then used to generate light patterns to etch the desired design. The two layer development chambers are used to apply the photoresist material. Here, the resist can be applied with spin-coating, electro-spray, or screen-painting methods, which helps to accurately control the thickness and evenness of the coating. The photoresist is then dried in the two pre-bake chambers, where the temperature and time can be adjusted to achieve optimal film adhesion. The rotating exposure chamber then exposes the substrate to the accurate optical pattern generated by the camera. Once this is complete, the substrate is transferred to the develop chamber for processing. The photoresist is then removed by using a liquid or gas bath, leaving only the desired design etched onto the substrate. Finally, this is followed by a cleaning process to remove residues, and the substrate is ready for use. TEL ACT 12 photoresist asset provides a precise and repeatable fabrication process for etched electronic products. This model helps reduce costly errors associated with manual methods and dramatically increases process consistency and throughput. Furthermore, this equipment helps ensure reliable results even when processing on intricate and complex designs.
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