Used TEL / TOKYO ELECTRON ACT 12 #9187391 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment developed by TEL for lithography and etching in the semiconductor industry. It is an advanced ion-assistance electron beam (IAEB) lithography system designed to deliver high-precision patterning performance and etching for ultra-tiny circuit structures down to less than 10 nanometers. The unit features breakthrough innovation in a number of areas, including a highly sensitive 7th generation Faraday deflector, improved beam mapping and control for fine focus adjustment and robust high-resolution imaging, and advanced dual beam optical elements for seamless on-the-fly switching between lithography and etching processes. This combination enables high-quality patterning that can even tackle 3-dimensional circuit structures. TEL ACT 12 also features advanced metrology systems to ensure process uniformity across the entire wafer. This includes high-resolution mapping to determine the resist profile on the wafer, and high-precision evaluation of the process effects. In addition, the machine provides automatic physical defect inspection and real-time checking of resist properties at different stages of the process. The high-resolution imaging and advanced metrology systems enable TOKYO ELECTRON ACT12 to offer a high level of defect management accuracy and usability. This includes defect reduction on the front-end and back-end stages of the process, and consistency of layer thickness and line width across the entire wafer. In addition, the tool is equipped with a range of tools to optimize and control exposure and dose, beam current, deflection, and trajectory, as well as compensate for factors such as line edge roughness and shorts and opens. It also features improved reliability with reduced downtime, and cutting-edge parallel processing capabilities for faster throughput. Altogether, TEL ACT12 is a breakthrough innovation in photoresist asset development, and provides an ideal platform for the highest performance lithography and etching processes in the semiconductor industry. Its cutting edge features, ease of operation, and high precision, make it a powerful model choice.