Used TEL / TOKYO ELECTRON ACT 12 #9235798 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment designed for the formation of microfine and ultrafine-details patterns on semiconductor wafers. It is based on the principle of photochemistry, which makes use of light to convert a certain chemical compound to a different form through a chemical reaction. At the core of TEL ACT 12 is an e-gun optical exposure system, which is used to precisely control the amount of light which is used in the photochemically driven reaction. This exposure unit utilizes a semiconductor wafer in combination with an electron beam, and a photomask containing the necessary pattern, in order to transfer the pattern onto the wafer. The electron beam is directed across the wafer in an array fashion and can be set to send different levels of intensity. A shutter is positioned in front of the wafer in order to allow varying levels of intensity to pass through. In addition to the e-gun optical exposure machine, TOKYO ELECTRON ACT12 also has a wafer stability tool which is used to ensure that the wafer remains stable during the film formation process. This asset makes use of a film transfer stage which is positioned in front of the wafer in order to support it during the exposure process, allowing for precise thickness control. It also incorporates a temperature control model which regulates the wafer temperature to ensure a uniform film formation. The overall equipment has a high throughput, and is capable of forming patterns on wafers of various sizes including, 4", 6", and 12". In addition, TEL ACT12 provides the flexibility to support a wide variety of resist films, includes positive and negative photoresists, as well as SU-8 and SU-8XL resists, In addition, the exposure system is capable of forming complex details, including 10-micron lines and spaces, and can reach a resolution of up to 150nm. The unit is also optimized for low particle generation, making it ideal for use in cleanroom environments. TOKYO ELECTRON ACT 12 is a highly advanced and efficient photoresist machine, which provides users with the flexibility and accuracy they need to create highly precise and intricate details on semiconductor wafers. It has a high throughput and is also user-friendly, making it an ideal choice for any photoresist applications.