Used TEL / TOKYO ELECTRON ACT 12 #9235799 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment that is commonly used in microfabrication processes, such as photolithography. It uses a liquid photoresist that is applied to the substrate and then exposed to a UV light source. The UV light causes the photoresist to chemically react, hardening it in areas exposed to the light and leaving unexposed areas softer. This process of creating a patterned surface by selectively hardening and softening photoresist is known as "image-forming". TEL ACT 12 is a highly advanced system that uses an advanced spin-coat/spray method to apply the photoresist uniformly. The unit includes a main processor, a wafer heater, and a multiple spinner machine with a spin-coat/spray head. The main processor controls the temperature and humidity of the tool during the spin-coat/spray process. Image forming is completed using TOKYO ELECTRON ACT12's exposure box. This box contains both a projectable and maskless exposure asset that uses nitrogen-purged optics to reduce any vapor pressure caused by heat from the lamp. The image-forming process is further assisted by ACT 12's reflector plate model, which reflects light between the exposure box and the substrate to ensure the even exposure of the exposed substrate. After image forming is complete, TOKYO ELECTRON ACT 12 has the ability to develop the substrate in a cleanroom environment. This is done using a specialized sprayer that efficiently applies the developer and removes the unexposed photoresist. TEL ACT12's developer equipment also has the capacity to quickly and accurately detect any defects present on the wafer. TEL / TOKYO ELECTRON ACT12 system is an efficient and reliable unit for photolithography processes. Its advanced spin coat and spray technology ensures that the photoresist is applied evenly over the substrate, and its projectable and maskless exposure machine ensures an even exposure of the substrate. Additionally, its developer tool is capable of quickly and accurately detecting any defects present on the substrate.