Used TEL / TOKYO ELECTRON ACT 12 #9239681 for sale

TEL / TOKYO ELECTRON ACT 12 is an advanced photoresist equipment designed for advanced semiconductor production. The system integrates two key components of the photolithography process; the spin coater and the spray coater. A spin coater applies photoresist to the wafer in a uniform layer, while a spray coater sprays the photoresist on the areas of the wafer designated by the resist pattern. With precise control of the application of the photoresist, TEL ACT 12 unit allows for faster production of complex circuits with higher yields. TOKYO ELECTRON ACT12 machine features two main components: the spin coater and the spray coater. The spin coater uses high-precision coating heads to deliver photoresist gas to the wafer surface in a uniform pattern, ensuring that the resist is applied evenly. Additionally, the spin coater is capable of spinning at varying speeds to ensure even distribution on irregularly shaped and curved wafers. The spray coater sprays photoresist onto the wafer in the locations indicated by the resist pattern. This spray coater is equipped with a built-in nozzle that is able to produce a fine and even droplet spray pattern that can deposit precise amounts of photoresist in the desired locations. TEL ACT12 tool is also equipped with a variety of features designed to make the photolithography process faster and more efficient. The mechanical precision of the spin coater and spray coater allows for a higher number of wafers to be processed in one cycle; up to 15 wafers per cycle. Additionally, the asset also features an advanced model for controlling the temperature and humidity of the resist during application, reducing the risk of smearing or poor illumination. Finally, the equipment includes a computerized monitoring system that is able to constantly monitor the results of each cycle, allowing users to accurately predict the results of each cycle and adjust as needed. TEL / TOKYO ELECTRON ACT12 unit is an ideal tool for high-volume semiconductor production. The precision of the spin coater and spray coater, as well as the innovative features designed to monitor the photolithography process, make ACT 12 a powerful and reliable photoresist machine.