Used TEL / TOKYO ELECTRON ACT 12 #9247862 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment developed by TEL (TOKYO ELECTRON). It is designed to enable repeatable, reliable, and accurate fabrication of circuits, patterns, and other elements onto semiconductor wafers, substrates, and other surfaces. The system uses photolithography to transfer a pattern onto a semiconductor wafer or substrate and is typically used for processing of microelectronic circuits, integrated circuits (ICs), and other devices. TEL ACT 12 photoresist unit includes three main components: the Mask Aligner assembly, the Development Unit, and the Exposure Controllers. The Mask Aligner assembly includes the Mask-holder and Reticle Aligner Table, which holds and aligns the photomask or reticle onto the substrate. The Development Unit is used for post-exposure processing of the resist films, which includes the preparation of the substrate for contact exposure and the development, stripping, and/or baking. The Exposure Controllers control and monitor the exposure process. The Mask Aligner assembly uses a CCD (charge-coupled device) camera to ensure accurate alignment and registration of the pattern on the photomask or reticle. It is equipped with environmental sensors and real-time position feedback to ensure accurate wafer-level registration. The Development Unit consists of a wet processing station, a dry processing station, and a bake station. The wet station is equipped with a heat sensor to ensure accurate temperature control and to ensure that the resist film is developed correctly. The dry station uses a vacuum chuck to hold the substrate and control the exposure parameters. The bake station uses a heater and temperature control to ensure uniform baking of the resist films. The Exposure Controllers are responsible for controlling and monitoring the exposure process. The exposure parameters such as exposure time, intensity, and wavelength can be precisely controlled by the Exposure Controllers. It also provides real-time feedback for end-to-end process control and optimization. The user can also save recipes for future use which allows the operator to run the same exposure process multiple times with only minor changes between runs. TOKYO ELECTRON ACT12 photoresist machine provides a reliable, repeatable, and accurate method of patterning on semiconductor wafers and substrates. The tool enables high-density patterns and accurate contact registration, resulting in improved circuit performance. The asset can also be used for process optimization and yield enhancement, offering improved cost-efficiency and integration of the photolithography process.