Used TEL / TOKYO ELECTRON ACT 12 #9251329 for sale

TEL / TOKYO ELECTRON ACT 12 is a high-performance photoresist equipment designed for advanced lithographic applications. Photoresist is the single most important material used in semiconductor processing, and TEL ACT 12 has been developed to provide the highest performance and reproducibility. TOKYO ELECTRON ACT12 is designed to provide a precisely controlled photoresist coating, with uniformity across the entire wafer. It is a modular system that can be configured to match the needs of any given application. The core components of the unit include two deposition chambers for photoresist coating, a spin rinse dryer, an oven, two post-coating cleaning stations, and a dedicated ten-port cassette loader. TEL ACT12 utilizes a variety of advanced technologies to ensure high-precision photoresist deposition. These include a programmable deposition head, laser interferometer feedback machine, temperature controlled drying, spin rinse drying, and an automatic TEL-optics tool for precise coating control. The asset also features a high-precision five-stage wafer vacuum chuck designed to ensure precise and consistent results. TOKYO ELECTRON ACT 12 is capable of coating up to 4,000 wafers per hour, and can be configured to accommodate various photoresist films of varying thickness. ACT 12 has been designed to ensure superior post-coating cleanliness, with two in-built cleaning stations. The chambers are specially designed to efficiently remove thin film residue and other surface contaminants, while the post-coating oven removes any residual materials and contaminants left during the coating process. TEL / TOKYO ELECTRON ACT12 is equipped with TOKYO ELECTRON advanced software, allowing both manual and programmed control of all model parameters. The software allows for precise control over photoresist deposition, as well as the ability to store and analyze data from multiple runs. ACT12 is an advanced photoresist equipment designed to provide reliable, precise and repeatable results for photolithographic applications. Its high-performance features, including programmable deposition head, laser interferometer feedback system, temperature controller, spin rinse dryer, automatic optics unit, five-stage wafer vacuum chuck, and post-coating cleanliness guarantees outstanding results. And with TEL / TOKYO ELECTRON advanced software, the machine can be used to control and analyze all coating parameters.