Used TEL / TOKYO ELECTRON ACT 12 #9270889 for sale

TEL / TOKYO ELECTRON ACT 12
ID: 9270889
Wafer Size: 8"
Coater / Developer system, 8".
TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment used by leading microelectronics companies in the production of integrated circuits and other sensitive electronic components. It is a versatile, high-precision lithography system which uses electromagnetic radiation such as ultraviolet light or electrons to imprint a pattern onto a photosensitive material. TEL ACT 12 unit uses a sophisticated mechanism of mechanical stages and vacuum plates to produce fine resolutions and depth of field control. A movable, two-axis precise mechanical stage is used to align and move the photoresist wafer. Its accuracy ensures high-quality results regardless of whether the wafer is large or small. The stage can move in the X and Y directions and is capable of up to 0.0001-micron accuracy. A vacuum plate then holds the substrate in place while the imaging is taking place, so the wafer does not move during the imaging process. The photoresist is applied using an automated chemistry machine, which precisely dispenses the required resist in predetermined patterns on the substrate. This resist protects the substrate during the photolithography process. The dispensing process is controlled by a computer to ensure accuracy, repeatability and efficient use of the chemicals. The imaging tool consists of a vacuum-tight, projection-type lithography tool which uses ultra-violet light to transfer the pattern from a mask onto the photoresist. For large substrates, the tool is capable of a minimum 11-µm accuracy and 0.35-µm resolution. It is designed for high-throughput production. TOKYO ELECTRON ACT12 asset also features automated defect analysis and detection. This feature uses sophisticated software algorithms to pinpoint defects in the pattern, enabling manufacturers to identify and address errors quickly and efficiently. TEL Photoresist ACT 12 model is designed to provide manufacturers with high-precision, repeatable lithography and imaging results. This ensures the highest level of accuracy and repeatability in the production and manufacture of microelectronic components.
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