Used TEL / TOKYO ELECTRON ACT 12 #9271250 for sale

TEL / TOKYO ELECTRON ACT 12
ID: 9271250
System 2004 vintage.
TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment which is used for etching, deposition and cleaning processes within the semiconductor fabrication industry. It is an advanced technique that provides accurate control over the etching of thin film layers on a surface. TEL ACT 12 enables users to accurately pattern, plot, and etch microfeatures with high resolution, high aspect ratio and with minimal photoresist residues. TOKYO ELECTRON ACT12 consists of a tool frame, an operation console, a Specialized Aperture control unit, and a Laser Irradiation System. The first two components allow users to control the unit as well as monitor and adjust the parameters accordingly. Specialized Aperture Control Unit (SACU) is responsible for ensuring the highest resolution of the microstructure. It accomplishes this by using a tightly integrated laser beam, shutter, and optics. By adjusting the laser beam size, beam shape, and focal spot size and position, the machine is able to generate the required pattern accurately with the smallest feature sizes possible. The Laser Irradiation Tool is designed to etch high aspect ratio microfeatures efficiently and with minimal photoresist residues. This is done by combining a computer-controlled laser pattern generator and an externally modulated laser optical asset. TEL ACT12 is designed to run different processes. The deposition process allows users to deposit thin films with desired features on a surface while the etching process helps to precisely etch patterns on the substrate. The model can also perform a deactivation process (to clean the surface of the substrate) after the etching process. TOKYO ELECTRON ACT 12 is an incredibly versatile photoresist equipment. It is capable of creating ultra-fine features with compatibility to a wide range of different substrates while consistently achieving exceptional results. These features, together with the simple user-oriented operation, make it an ideal choice for the etching, deposition, and cleaning process in the microfabrication industry.
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