Used TEL / TOKYO ELECTRON ACT 12 #9359297 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment designed for high-precision photomask production that features high throughput and highly accurate patterning of critical layers. It is an automated lithography system based on a high-assurance, programmable transmission-mode lithography (TML) process. TEL ACT 12 utilizes a quad-column scan unit for X-Y movement of the wafer stage, and high-precision linear- and vertical-axis stages for substrate positioning in the Z-direction. This combination of axes enables the machine to be used for photoresist processes from pre-bake to post-exposure bake. Additionally, TOKYO ELECTRON ACT12 implements several advanced technologies to realize stable patterning and high-resolution printing. A "column beam coupling" tool ensures that generated laser light is evenly distributed, owing to independent drive axis control. This attribute helps maintain uniform imaging across the field of view. Furthermore, the asset incorporates four independent beam alignment mechanisms that minimize aberrations arising from optical path fluctuations and wafer coordinate mismatches. Two 6KS scanners are installed for simultaneous wafer scanning. This reduces the aspect ratio to a maximum of 10, allowing for high area throughput. Additionally, the model utilizes a high-precision vertical scan stage, in the Z direction, to enable fine focus adjustment of the wafer plane that helps maintain uniformity of the exposure dose across the wafer. It also implements a high-precision encoder servo drive mechanism to minimize imaging errors, meaning that highly precise and reliable patterning is achieved. Furthermore, TEL / TOKYO ELECTRON ACT12 achieves excellent wafer-to-wafer repeatability due to TEL unique "PHASE at All Directions (PARaDs)" technology. Thanks to this patented technology, even if the wafers are each slightly different in planarity, the same imaging conditions can be applied to all of them. In conclusion, ACT 12 is a high-end photoresist lithography equipment that takes advantage of several advanced technologies to deliver high throughput, highly accurate patterning, and excellent wafer-to-wafer repeatability. With a combination of highly accurate stages for substrate movement and independent beam alignment mechanisms, it is able to produce excellent results in the photomask production processes.