Used TEL / TOKYO ELECTRON ACT 12 #9377247 for sale

TEL / TOKYO ELECTRON ACT 12 is a photoresist equipment used for lithography processes. This system uses reactive chemistry to transfer a layout pattern onto a substrate such as a wafer. The whole process is based around a process called photolithography, where light is used to transfer a pattern from a mask onto a wafer. The process begins with a photosensitive material, also known as photoresist, being applied to the wafer. This photoresist is exposed to light which serves as a mask. When the wafer is developed in a series of chemicals, only the areas that were exposed to light remain on the wafer. TEL ACT 12 is a highly sophisticated unit that is capable of controlling the ultraviolet light used from an excimer laser, enabling precise control of the light exposure duration and intensity. This combination of advanced control features allows for precise and intricate patterns to be printed onto the wafer. The machine is operated by a computer-controlled wafer stepper-scanner, which is responsible for accurately positioning the wafer so that the mask is precisely aligned to the wafer's circuitry pattern. This stepper-scanner also has the capability of controlling the position of the photoresist mask for focus, in order to ensure the exact pattern is printed onto the wafer. The photoresist is then developed in a developer, where the exposed parts of the photoresist dissolve away, leading to what's known as a "developed" photoresist. This process allows for a precise etching of the various layers in an integrated circuit. TOKYO ELECTRON ACT12 tool can accommodate a wide range of substrates, from high-purity silicon wafers to quartz and glass, and can incorporate a varied number of stepper-scanner processes to fit different lithography applications. Its ability to simultaneously perform numerous processes has made it the indispensable tool used in the production of semiconductor devices. In summary, ACT12 is a photolithography asset that uses ultraviolet light and reactive chemistry to precisely etch patterns onto a substrate. This model is highly versatile and can accommodate a wide range of substrates, from high-purity silicon wafers to quartz and glass, and can incorporate a varied number of stepper-scanner processes to fit different lithography applications.